Logipol Polishing Fluid

Product Name: Logipol Polishing Fluid
Availability: In Stock

Available Options

* Logipol Polishing Fluid:

Name	Sku	Summary
LogiPol CMD30 3 Micron Polishing Fluid - 18.9 ltr	0CON-508	LogiPol CMD30 Polishing Fluid 3 Micron 18.9ltr
Logipol CS60 Polishing Solution - 22.7 ltr	0CON-510	Logipol CS60 Polishing Solution - 22.7 ltr
Logipol 35 Polishing Fluid - 4 ltr	0CON-493	LogiPol 35 polishing fluid 4litres
LogiPol CMD30 3 Micron Polishing Fluid - 3.78 ltr	0CON-509	LogiPol CMD30 3 Micron Polishing Fluid - 3.78ltr
Logipol CMP cleaning solution for use with 0CON-SiC 3.5kg bottle	0CON-SiC-CLN	LogiPol CMP cleaning solutions for use with 0CON-SiC, 3.5kg bottle
Logipol CS60 Polishing Solution - 4.5 ltr	0CON-511	Logipol CS60 Polishing Solution - 4.5 ltr
LogiPol CS20 Polishing Fluid - 2 ltr	0CON-507	LogiPol CS20 Polishing Fluid 2Ltr
	Total :

Logipol 35 Polishing Fluid - 4 ltr - Logipol 35 polishing fluid is a sodium hypochlorite based additive for III-V and II-VI Semiconductor wafer polishing - can be mixed with Alumina or Colloidal Silica based polishing slurries to improve polishing rate
Logipol CMD30 3 Micron Polishing Fluid - 18.9 ltr - Used in polishing hard material substrates including Silicon Carbide/Silicon/Alumina/Ceramic
Logipol CMD30 3 Micron Polishing Fluid - 3.78 ltr - Used in polishing hard material substrates including Silicon Carbide/Silicon/Alumina/Ceramic
Logipol CS20 Polishing Fluid - 2 ltr - Logipol 20nm Colloidal Silica is used in polishing/planarisation of IC's/dies
Logipol CS60 Polishing Solution - 4.5 ltr - Logipol 60nm Colloidal Silica polishing solution for polishing III-V Semiconductor materials including Indium Phosphide
Logipol CS60 Polishing Solution - 22.7 ltr - Logipol 60nm Colloidal Silica polishing solution for polishing III-V Semiconductor materials including Indium Phosphide
Logipol SiC - 3.5kg - Logipol SiC CMP slurry for Silicon Carbide
Logipol CMP Cleaning Solution - CMP cleaning solution for use with Logipol SiC
Logipol Cu 15L - CMP polishing solution
Logipol Cu 5L - CMP polishing solution
Logipol Pl - Polishing solution
Logipol W 15L - Tungsten polishing slurry
Logipol W 5L - Tungsten polishing slurry